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    AVC-150

AVC-150
Anti-stiction layer coating system



A chlorosilane-based chemical such as FOTS is the typical material of the vapor phase deposition. The process of gas phase deposition is very simple and easy. The vapor deposited monolayers can be used as a anti-stiction layer or reactive adhesion layer in nanoimprint lithography

Wetting related defects may occur during liquid phase SAM deposition of the antistiction layer on the nanometer-scale mold coating. The SAM solution can not penetrate to the nanometer structure because of trapped air. Consequently, the mold may result in a very poor coating. Vapor phase process has its advantage when the mold features are in nanometer scale. In addition, vapor phase process eliminates the use of organic solvents and greatly simplifies the handling of the sample.
After loading your device into the vacuum chamber, the sample is treated with a plasma to clean and activate the surface. And various SAM precursors are deposited on that surface, sequentially




Feature

  • Integrated Surface Preparation
  • Automated Operation
  • Controllable
  • Compact design
  • Faster & Safer
  • Inexpensive
  • Superior Film Quality
  • Available to coating simultaneously 300mm 4pcs
  • Available to coating 3D Structure
  • Patent No. : 10-0994920


    SVS SERIES Applications
  • Nano imprint / Lithography : Release layer
  • Sensor and Actuator : Stick prevention
  • Bio – MEMS : Bio-compatible coating
  • Drug Discovery : Anti- Fouling Barrier
  • Micro-Fluidics : Controlled wetting
  • Micro-optics : Protective coating

Process Specification




 

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